Vacuum heat treatment causes reduction of thin films deposited on glass substrates

Vacuum heat treatment causes reduction of thin films deposited on glass substrates
Core Tip: [Tags: SY_Introduction]

When the turbine load decreases, the temperature difference of the condenser end difference and the cooling water in the condenser is reduced to different extents under the premise of constant cooling water flow. When the working water cooler is fouled or blocked, the heat exchange capacity of the cooler is reduced, and the front difference t of the cooler is accordingly increased, resulting in a decrease in T and an increase in the likelihood of cavitation. In addition, the temperature rise of the working water in the vacuum pump is mainly caused by the continuous agitation of the working water by the vacuum pump blades and the exothermic condensation of steam in the pumped air-steam mixture. Therefore, the lower the efficiency of the vacuum pump, the lower the suction air- The greater the amount of steam condensation in the steam mixture, the greater the temperature rise of the working water in the vacuum pump, thus making the vacuum pump more likely to cavitation.

However, after the heat treatment, the composition of the phases in the films had a large difference, and the diffraction peaks in the films deposited on the glass substrate became sharper and the diffraction peak appeared but was very weak. In the presence of relatively sharp peaks, the diffraction peaks, while in the diffraction peaks, did not appear before the heat treatment, unknown components. The analysis shows that the vacuum heat treatment causes a reduction reaction in the thin film deposited on the glass substrate to form a variety of low-valence vanadium oxides, and the like; and the thin film deposited on the silicon substrate obviously has not been crystallized after the heat treatment. The phase composition caused a significant change, but the original diffraction peak intensity was significantly enhanced. It is known from the foregoing analysis that during the vacuum heat treatment, bonds with weak bonds in the vanadium oxide film will be broken, and some of the oxygen atoms will be precipitated, so that the proportion in the film will increase to achieve the purpose of reduction. As the temperature of the substrate increases, the room temperature resistivity of the film decreases. As the temperature of the substrate increases, the atomic migration of the atoms on the surface of the substrate during the growth of the film is promoted, and the growth of the crystal grains is promoted to form a more continuous and uniform film. The thin film, so the resistivity decreases. Through the linear fitting near room temperature, it can be calculated that the absolute value decreases with the increase of the substrate temperature.

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