In response to growing demand in the semiconductor industry, Dow Corning’s Electronics Division announced on February 19 in Michigan that it plans to more than double its silicone production capacity. This expansion aims to support the increasing need for advanced materials used in semiconductor manufacturing, particularly in the development of novel bilayer photoresists.
The company is focusing on enhancing the performance of silicon-based materials in lithography processes, which are critical for producing smaller and more efficient chips. Jeff Bremmer, Dow Corning’s global program manager for silicon lithography, emphasized that this expansion will not only boost production but also accelerate the adoption of silicone-based solutions across the industry.
Photoresists are essential in semiconductor fabrication, as they are sensitive to light or radiation and undergo chemical changes during exposure. This allows for precise patterning on silicon wafers, enabling the creation of intricate circuit designs. Dow Corning’s innovative combination of silicone and photo-sensitive materials enables thinner, more uniform resist layers, improving resolution and etching performance.
Since 2004, Dow Corning has collaborated with leading photolithography material suppliers to develop silicone-based photoresists. In December 2006, the company partnered with a Japanese firm to create a bilayer photoresist that uses Dow Corning’s proprietary silicone resin in the imaging layer. This technology offers superior etching selectivity for 193 nm photolithography, a key process in modern chip manufacturing.
Last year, the two companies announced that their bilayer photoresist had been successfully adopted by a major global memory chip manufacturer, marking a significant milestone in the commercialization of silicone-based lithography materials. This development underscores Dow Corning’s commitment to driving innovation in semiconductor technology and meeting the evolving needs of the industry.
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